분석장비

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MProbe In-Situ

Real-time optical thickness monitor

측정 방식 비 접촉식 측정
측정 범위 1 nm ~ 500 µm
정 밀 도 0.1Å or 0.01% (greater of)
빔 크 기 3 mm typical (depends on configuration)
응용 분야 Real time measurement in line process
Any translucent films can be measured quickly and reliably: Optical coatings, Oxides,Nitrides, Photoresists, Polymers, Semiconductors (Si, aSi, polySi),
Compound Semiconductors (AlGaAs, InGaAs, CdTe,CIGS),Hard coatings (SiC, DLC), metal oxides, thin metal films and many more.
 
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Real-time broadband optical thickness monitor. Special model – MProbe UVVisF – for

measurement in high ambient light environment e.g. sputtering or other plasma assisted deposition techniques. Use of high-intensity flush Xe lamp with gated data acquisition, allows

accurate measurement in most challenging environment.

 

Flexible integration: reflectance probe can be placed outside the deposition chamber optical

port or inside, using a fiberoptics feedthru. Light can be focused on the sample surface or collimated.

 

Fast – no moving parts: typical measurement ~ 20ms

Any translucent films can be measured quickly and reliably.

 

Extensive materials library: (500+ materials- new materials easily added). Support of

parameterized materials: Cacuhy, Tauc-Lorentz, Cody-orentz, EMA and many more….

 

Easy integration with deposition control: OPC (DA2.0/3.0) and ModbusTCP interface.

Hardware triggers (5V TTL) or programmable RS232 command.

 

Measured parameters: thickness, optical constants, surface roughness.

 

Chamber integration: Optical adapter (reduced kinematic mount) integrates smoothly with optical port flange, feed-thru adapter option for low/room temperature chambers

Integration with chamber control system (SCADA): build-in Modbus and OPC servers(optional)

 

Applications

Any translucent films can be measured quickly and reli­ably: Optical coatings, Oxides,Nitrides,

Photoresists, Poly­mers, Semiconductors (Si, aSi, polySi), Compound Semi­conductors (AlGaAs,

InGaAs, CdTe,CIGS),Hard coatings (SiC, DLC), metal oxides, thin metal films and many more.