MProbe In-Situ
Real-time optical thickness monitor
측정 방식 | 비 접촉식 측정 |
---|---|
측정 범위 | 1 nm ~ 500 µm |
정 밀 도 | 0.1Å or 0.01% (greater of) |
빔 크 기 | 3 mm typical (depends on configuration) |
응용 분야 | Real time measurement in line process |
Any translucent films can be measured quickly and reliably: Optical coatings, Oxides,Nitrides, Photoresists, Polymers, Semiconductors (Si, aSi, polySi), | |
Compound Semiconductors (AlGaAs, InGaAs, CdTe,CIGS),Hard coatings (SiC, DLC), metal oxides, thin metal films and many more. | |
첨부1 | 카다로그 |
Real-time broadband optical
thickness monitor. Special model – MProbe UVVisF – for
measurement
in high ambient light environment e.g. sputtering or other plasma assisted
deposition techniques. Use of high-intensity flush Xe lamp with gated data
acquisition, allows
accurate
measurement in most challenging environment.
Flexible integration: reflectance probe can be
placed outside the deposition chamber optical
port
or inside, using a fiberoptics feedthru. Light can be focused on the sample
surface or collimated.
Fast – no moving parts: typical measurement ~
20ms
Any
translucent films can be measured quickly and reliably.
Extensive materials library: (500+ materials- new
materials easily added). Support of
parameterized
materials: Cacuhy, Tauc-Lorentz, Cody-orentz, EMA and many more….
Easy integration with deposition
control:
OPC (DA2.0/3.0) and ModbusTCP interface.
Hardware
triggers (5V TTL) or programmable RS232 command.
Measured parameters: thickness, optical
constants, surface roughness.
Chamber integration: Optical adapter (reduced
kinematic mount) integrates smoothly with optical port flange, feed-thru
adapter option for low/room temperature chambers
Integration with chamber control system (SCADA): build-in Modbus and OPC
servers(optional)
Applications
Any translucent films can be measured quickly and reliably:
Optical coatings, Oxides,Nitrides,
Photoresists, Polymers, Semiconductors (Si, aSi, polySi),
Compound Semiconductors (AlGaAs,
InGaAs, CdTe,CIGS),Hard coatings (SiC, DLC), metal oxides,
thin metal films and many more.